br brion.c ion.com om ................................................... Pattern Matcher FullChip LITHOTUNER PATTERN MATCHER FULLCHIP IS A SOLUTION THAT MATCHES EACH SCANNER TO EVERY RETICLE .......................................................... Pattern Matcher FullChip brings complete optimization across all critical structures with exact scanner performance characterizations. Complete Chip Analysis Full chip analysis ensures that every critical structure is addressed in the matching optimization. Matching is no longer constrained to simple 1D through-pitch or limited pattern sets. Matching now finds and optimizes all sensitive patterns through the full process window. For the first time, matching optimization can cover the full chip over the entire process window, and with the exact variances of the actual scanners in the fab. Full Scanner Characterization Pattern Matcher FullChip identifies any structures sensitive to the actual scanner variations and includes them in the optimization. Each scanner’s data is automatically obtained and used in the matching calculation. A range of internal adjustments including NA, Sigma, Stage tilt and Ellipticity is used to tune each scanner individually. Figure 1: Scanner matching progress from design to product-specific • Pre-determined patterns • Automatically determined optmization • 6 scanner knobs critical patterns • 20 scanner knobs - NA, σ, focus range, dose - HV ellipticity - NA, σ, focus range, dose • Product or test structures - 15 pupicom knobs • Advised for advanced nodes and intertype matching Pattern Matcher FullChip Pattern Matcher FullChip Product Features ....................... Performance Benefits  Full chip analysis ensures all critical features are optimized  Uses industry leading Tachyon models  Extends the set of tuning patterns by Untuned complementing wafer-based CD data Manual tuning with model-based analysis for the full chip Pattern Matcher FullChip Auto-selected Complete Access to ASML Scanners’ hotspots Tuning Functions  NA, sigma, dose, and focus range Figure 2: Matching different feature types on TWINSCAN XT:1400E and XT:1250D systems  Full ellipticity control Ease of Use 1.2 1.2  Simplified workflow 1700-1900i 1700-1250i 1.0 1.0  User-friendly GUI Figure 3: Using more 0.8 0.8 tuning parameters enables 0.6 0.6 better CD matching Builds on Pattern Matcher / 0.4 0.4 between scanners Lithoserver Products 0.2 0.2  Automated scanner connectivity 0 0  Installation requires no scanner downtime Adjustment knob Adjustment knob Figure 4: The Pattern Matcher Figure 5: Adding knobs for improved matching product architecture © 2008 Brion Technologies, Inc. All rights reserved. Brion Technologies, Inc. • Phone: +1 (408) 653-1500 • Email: info@brion.com • brion.com rev120208 Normalized residual mismatch on >2500 patters CD matching RMS normalized to all 1D patterns Dose targeting NA + sigma + stage tilt + pupicom Normalized residual mismatch on >2500 patters Dose targeting NA + sigma + stage tilt + pupicom